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2D Materials for Future Electronics

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Hybrid Session
3 March 2026
  • Hybrid Session
  • 3 March 2026

Hybrid Session Live Streaming from in-person workshop "2D Materials for Future Electronics"


AMO GmbH, the Aachen Graphene & 2D Materials Center, and RWTH Aachen University will continue their successful series of events dedicated to 2D materials. This year's workshop on “2D Materials for Future Electronics” will take place in person on March 3–4, 2026, in Aachen, Germany, bringing together leading researchers and industry experts to explore the latest advances and future opportunities for electronic applications. The workshop will feature a special hybrid session in collaboration with 2D-PL, which will be live-streamed from 16:50-18:05 on 3 March 2026, allowing remote participants to actively interact with speakers and the in-person audience.

Speakers

Gordon Rinke
Moderator

Gordon Rinke


AMO

Inge Asselberghs

Inge Asselberghs


imec

Miika Soikkeli

Miika Soikkeli


VTT

Nadine Collert

Nadine Collaert


imec

16:50 16:50 - 16:55

Introduction

Inge Asselberghs, imec

16:55 16:55 - 17:05

2D-PL Multi Project Wafer runs

Gordon Rinke, AMO

17:05 17:05 - 17:35

2D Material Integration on Si CMOS Back-End-of-Line for Sensors

Miika Soikkeli, VTT

Abstract: 2D material Si CMOS back-end-of-line integration can enable novel sensor solutions for several application areas such as biosensors, IR cameras, gas sensors and pressure sensors. The latest developments in 2D-PL project related to the processing, metrology, process design kit (PDK) and use cases from customers will be presented.

17:35 17:35 - 18:00

The Good, The Bad, and The MX2: Benchmarking 2D Materials Against the Semiconductor Giants

Nadine Collaert, imec

Abstract: 2D materials like MX2 offer transformative potential for logic, memory, RF and optical applications and even beyond that, due to their exceptional electrostatic control and carrier mobility. However, the path to commercial compute and connectivity is blocked by entrenched incumbents: silicon FinFET, GAA, and CFET architectures, alongside III-V devices, emerging optical technologies and 3D integration techniques. This presentation evaluates the competitive gap, identifying the "ugly" realities of large-scale synthesis, contact resistance, gate stack, and thermal management. By benchmarking 2D performance against current industry roadmaps, we define the critical milestones required for these atomic-scale layers to transition from laboratory curiosities to indispensable components in the global semiconductor ecosystem.