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Pioneering 2D Materials for Semiconductor Industry

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Hybrid: Aachen, Germany + Digital
22 November 2022
  • Hybrid: Aachen, Germany + Digital
  • 22 November 2022

Integration of 2D materials into photonic platforms

This workshop, hosted by the Graphene Flagship's 2D-EPL and its partner AMO, will the examine the integration of 2D materials into photonic platforms. This free hybrid event will take place in Aachen, Germany as part of the two-day Integration of novel materials into silicon photonics workshop and be live streamed to digital attendees.

Speakers and panellists

Inge Asselberghs

Inge Asselberghs


Daniel Neumaier
University of Wuppertal

Daniel Neumaier

15:00 15:00 - 15:15

2D-EPL status update

Inge Asselberghs, IMEC

Inge Asselberghs
15:15 15:15 - 16:00

Keynote: Integration of graphene and 2D-materials on Si and SiN Photonic ICs

Dries Van Thourhout, IMEC & Ghent University

In this talk, I will review our recent work on hybrid graphene-Si waveguide modulators and compare with state-of-the-art.  The talk will cover both lab-processed devices and devices processed in a 300mm CMOS-pilot line, which demonstrate the scalability of the 2D-materials based optoelectronic devices. In an outlook section I will also discuss alternative applications in non-linear optics and advanced lasers.

Dries Van Thourhout
16:00 16:00 - 16:30

Towards the integration of Graphene modulators into the CMOS pilot line

Mindaugas Lukošius, IHP

Thanks to its unique electronic band structure, graphene has a great potential to extend the functionalities of a large variety of devices. Despite the significant progress in the fabrication of various graphene based microelectronic devices, the integration of graphene devices still lack the stability and compatibility with Si-technology processes. Therefore, the investigation and preparation of graphene devices in conditions resembling as close as possible the Si technology environment is of highest importance. Towards this goal, this work focuses on the full spectra of graphene research aspects in 200mm pilot line. The insights into processes of graphene modulator fabrication in a 200mm wafer pilot line will be presented.

Mindaugas Lukošius
16:30 16:30 - 17:00

Panel discussion

Chair: Daniel Neumaier 

Steven Koester (University of Minnesota)
Dries Van Thourhout
Mindaugas Lukosius 
Inge Asselberghs 

Steve Koester Dries Van Thourhout Mindaugas Lukošius Inge Asselberghs Daniel Neumaier