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2D-PL multi-project wafer run 4


EU Funded

The 2D-PL's fourth MPW run is mainly intended towards electronics but can also include sensor devices (e.g. Hall sensor, but via opening on graphene is not in the scope of this run) and will be provided by AMO GmbH. The design of the device can be adjusted within the specifications. The offered device structure is a GFET (Fig. 1) consisting of the following fabrication steps:

More details on the PDK can be found here.

 

Figure 1 Scheme with the different layers of the final GFET structure.

Key features of the GFET fabrication

  • Minimum feature size (CD) ≈10µm, for both the graphene and the metal layers
  • Local back gate (Au or Pd)
  • Dielectric deposition & vias opening
  • Bottom contacts fabrication (as local BG)
  • Wafer-scale graphene transfer & patterning
  • Encapsulation & vias opening (not on top of graphene)
  • Optional: Au Bondpads

Key parameters

Graphene mobility

 

>1000 cm²/V·s

Avg. Sheet Resistance

n= – 5 · 1012 cm-2

~1 kΩ

Avg. Contact Resistance

n= – 5 · 1012 cm-2

~1 kΩ µm

Minimum working devices

 

>80 %

Dirac point

 

-10V … +10V

Safe gate-source voltage range

 

± 20 V

 

Substrate 

  • Material: Silicon/SiO2 (90nm)
    • Si Resistivity 1-10 Ohm-cm
    • Thickness 675+/-25µm
  • Basic die size: 1 x 1 cm²

Characterization

  • Raman characterization
  • Electrical measurement for as-fabricated reference devices
  • General optical inspection of your devices

PRICE

  • 3600€ set price for 8 dies with identical design (1x1 cm²)
  • Each additional die with identical design costs 450€ more
  • 50% discount is available through the 2D-PL support programme

IMPORTANT DATES

If you are interested in any of our capabilities, please contact us at 2DPL@graphene-flagship.eu. Whether you are exploring a new concept or have a specific process in mind, our team can help assess your project's feasibility, discuss technical requirements, and identify the most appropriate fabrication route.

ACCESS

Both the PDK and the fabrication services are enabled following the signature of the AMO Non-Disclosure Agreement (NDA). The PDK is available free of charge to interested parties. For more information or to request access to the services, please contact 2DPL@graphene-flagship.eu.

wafer production

Reduced fees

The 2D-PL Support Programme lowers the obstacles for researchers and companies wanting to join our multi-project wafer (MPW) runs. Selected participants can receive a reduction of up to 50% off the MPW fee in exchange for providing feedback on the received devices in the form of a short interview with the hosting pilot line. Your feedback helps us improve future runs. 

2D-PL support programme
Map of Europe with Aachen called out with an image of the AMO building

About AMO

Located in Aachen, Germany, close to the borders of Belgium and the Netherlands, the research foundry AMO GmbH, a non-profit nanotechnology SME, follows the mission to efficiently close the gap between university research and industrial application. It demonstrates innovative technologies and introduces new materials, including their implementation in novel device architectures, prototyping and small volume fabrication. A state-of-the-art 400 m² cleanroom is operated and a range of services from consulting to prototype development is offered. In recent years, AMO has become a global player in 2D materials research for electronics and photonics.

AMO Gmbh
Otto Blumenthal-Str. 25
52074 Aachen
Germany

Email: 2d-PL@amo.de